AlScN/GaN HEMTs Grown by Metal-Organic Chemical Vapor Deposition With 8.4 W/mm Output Power and 48 % Power-Added Efficiency at 30 GHz

نویسندگان

چکیده

We report on DC and RF measurement results of AlScN/GaN high electron mobility transistors (HEMTs) grown by metal-organic chemical vapor deposition (MOCVD). Comparing the properties with those a wafer same MOCVD tool but featuring an AlGaN barrier, sheet carrier density ( $\text {n}_{\text {s}}$ ) notation="LaTeX">$1.50\times 10^{{13}}$ cm notation="LaTeX">$^{-{2}}$ measured is around 60 % higher. This translates to power {P}_{\text {out}}$ 8.4 W/mm at frequency 30 GHz drain bias V. Also, power-added efficiency (PAE) 48.9% 46.1% reached, when biased 25 V V, respectively. These early illustrate great potential devices carry for improving achievable output device level millimeter-wave (mmWave) frequencies.

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ژورنال

عنوان ژورنال: IEEE Electron Device Letters

سال: 2023

ISSN: ['1558-0563', '0741-3106']

DOI: https://doi.org/10.1109/led.2022.3220877